| 摘要 |
<p>Described is a process for utilizing an electric AC signal of a frequency preferably between 0.1 kHz and 1 GHz to modify and otherwise enhance the properties of deionized water used for the purpose of cleaning semiconductor wafers and computer storage disks before, during and after processing. Such treatment of the cleaning water enhances its ability to remove process chemicals, remove particulates, and otherwise improve the speed and economy of the cleaning process thereby directly improving the final yield of the chip or disk making process.</p> |
