发明名称 PHOTOCURABLE COMPOSITION, FLEXIBLE PHOTOSENSITIVE ARTICLES MADE THEREFROM AND METHODS OF IMPROVING SOLVENT RESISTANCE AND FLEXIBILITY OF THOSE ARTICLES
摘要 An aqueous developable, photocurable composition and a method of improving solvent resistance and flexibility are disclosed. The composition comprises (a) an acid-containing copolymer having an acid ephr of at least 0.20 and (b) an acid-containing polymer suitable for flexibilizing the composition, which has at least one free ethylenically unsaturated group. It is preferable that either (a) or (b) or both are further reacted with a compound having a free ethylenically unsaturated group and a free acid reactive group, e.g. glycidyl(meth)acrylate. When the composition is formulated with an ethylenically unsaturated monomer and photoinitiator, the photocurable composition is especially suitable for use in an aqueous developable, flexible printing plate.
申请公布号 CA2076511(A1) 申请公布日期 1993.03.17
申请号 CA19922076511 申请日期 1992.08.20
申请人 MIRLE, SRINIVAS K.;WILLIAMS, TREVOR J. 发明人 MIRLE, SRINIVAS K.;WILLIAMS, TREVOR J.
分类号 C08F2/44;C08F2/48;C08F290/00;C08F299/00;G03F7/027;G03F7/032;G03F7/033;G03F7/038;(IPC1-7):G03F7/038 主分类号 C08F2/44
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