| 发明名称 |
Lithium niobate etchant |
| 摘要 |
Oxides of tantalum and niobium are selectively etched using patterned silicon oxide deposited by a low-temperature chemical vapor deposition as a mask and a sulfate flux to selectively remove exposed portions of the tantalum or niobium oxide substrate.
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| 申请公布号 |
US5194117(A) |
申请公布日期 |
1993.03.16 |
| 申请号 |
US19910712234 |
申请日期 |
1991.06.07 |
| 申请人 |
AT&T BELL LABORATORIES |
发明人 |
BINDELL, JEFFREY B.;CARGO, JAMES T.;HOLMES, RONALD J. A.;HUGHES, MICHAEL C. |
| 分类号 |
C04B41/53;C04B41/91;C09K13/00;G02B6/136;H01L41/24 |
主分类号 |
C04B41/53 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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