| 发明名称 |
PHOTOREACTIVE POLYMERS AND PRODUCTION OF A TWO-LAYER RESIST |
| 摘要 |
Silicon-containing photoreactive Polymers have N-ylide structures of N-hetero aromatics which undergo photochemical structural and property changes when exposed to actinic light. They are suitable for the production of two-layer photoresists. |
| 申请公布号 |
CA1314652(C) |
申请公布日期 |
1993.03.16 |
| 申请号 |
CA19890591623 |
申请日期 |
1989.02.21 |
| 申请人 |
SCHWALM, REINHOLD |
发明人 |
SCHWALM, REINHOLD;KOCH, HORST |
| 分类号 |
G03F7/038;C08F20/52;C08F26/00;C08F28/00;C08F30/02;C08F30/08;C08F220/04;C08F220/60;C08F226/06;C08F228/00;C08F230/02;C08F230/08;G03F7/075;G03F7/26 |
主分类号 |
G03F7/038 |
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