| 摘要 |
PURPOSE:To obtain an exposure calculating device which calculates appropriate exposure by deciding the importance of consideration in the cases of finely splitting and roughly splitting an object field as an object to be photographed so as to perform the photometry in accordance with photographing conditions. CONSTITUTION:Plural areas of a split photometry means 100 are classified into a 1st pattern and a 2nd pattern, and synthesized photometric values 101, 103 in every classified area are calculated based on the photometric value of a split photometry area included in each classified area of each pattern, and also exposure values 102, 104 of each pattern are calculated based on these synthesized photometric values. And the contribution ratio 105 of the exposure value of each pattern is calculated in accordance with the photographing conditions such as the maximum photometric value, a difference between the maximum and minimum photometric values, a mean photometric value and a photographing distance, etc., and the exposure value of each pattern is synthesized in accordance with the contribution ratio, and the exposure value 106 for performing the exposure control is calculated. |
