| 摘要 |
PURPOSE:To obtain a positive type photoresist compsn. excellent in resolution, sensitivity, developing property, heat resistance and resist shape, and suitably used as a photoresist for fine work. CONSTITUTION:This compsn. features in that it contains at least one kind of compd. expressed by formula I as well as an alkali soluble resin and quinonediazide compd. In formula I, R1 is a hydrogen atom, alkyl group, aryl group, X is an alkylene group of single bond with 1-2 carbon number, R2 is an alkyl group, alkoxy group, hydrogen atom, hydroxyl group, carboxyl group, or halogen atom, (n) is an integer 1-5. |
