| 摘要 |
PURPOSE:To produce large quantities of optical disks in a short period of time by executing exposing while bringing the mask-side surface of a substrate with a light non-transparent mask into tight contact with the resist side surface of a substrate with a photoresist film. CONSTITUTION:The photoresist 3 is applied on the glass substrate 1 with the chromium mask 2 and is irradiated with a condensed laser beam 5 according to information. The chromium mask with information patterns is thereafter obtd. by developing and etching. The photoresist mask of a positive type is brought into tight contact with a silicon wafer, quartz, glass or metallic plate 6 and is exposed and developed to form patterns on the photoresist; thereafter, the photoresist is dry etched, by which a stamper 6-1 having the recessed patterns is obtd. If one sheet of the chromium mask is produced by cutting, many sheets of the recessed pattern stampers can be thereafter easily produced in a short period of time according to this method. |
