PROTECTIVE LAYER FOR PREVENTING ELECTROLESS DEPOSITION ON A DIELECTRIC

摘要

A dielectric substrate is coated with a protective layer and a catalyst film is formed in a laser irradiated predetermined pattern on the protective layer so that during electroless deposition a metal is plated on the catalyst film in the predetermined pattern whether or not the dielectric has unwanted catalytic sites. The protective layer is not removed by the electroless plating bath or prior etch steps but can subsequently be stripped by a separate etch without removing the plated metal or the dielectric from the substrate.