FLAT PLATE MAGNETRON SPUTTERING METHOD,申请号JP19910240213-传众专利搜索

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发明名称	FLAT PLATE MAGNETRON SPUTTERING METHOD
摘要
申请公布号	JPH0559545(A)	申请公布日期	1993.03.09
申请号	JP19910240213	申请日期	1991.08.28
申请人	ANELVA CORP	发明人	ISHIBASHI KEIJI
分类号	C23C14/08;C23C14/34;C23C14/35;C23C14/50	主分类号	C23C14/08
代理机构		代理人
主权项
地址

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