PRODUCTION OF HIGH RESISTANCE SILICON WAFER,申请号JP19910245152-传众专利搜索

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发明名称	PRODUCTION OF HIGH RESISTANCE SILICON WAFER
摘要
申请公布号	JPH0558788(A)	申请公布日期	1993.03.09
申请号	JP19910245152	申请日期	1991.08.30
申请人	SHIN ETSU CHEM CO LTD;SHIN ETSU HANDOTAI CO LTD;SHINETSU QUARTZ PROD CO LTD	发明人	WATABE HIROYUKI;TAKITA MASATOSHI;MATSUMURA MITSUO;MATSUI HIROSHI;FURUSE SHINICHI
分类号	C30B15/10;C30B29/06	主分类号	C30B15/10
代理机构		代理人
主权项
地址

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