发明名称 MASK DATA GENERATION SYSTEM FOR SEMICONDUCTOR MANUFACTURE
摘要 PURPOSE:To generate the mask data for semiconductor manufacture by hierarchically developing array structure data for CAD data which are inputted. CONSTITUTION:An arithmetic means 4-6 is equipped with a storage means 4-64 for two pieces of array information of a specific array arrangement information extracting means 4-62 and a specific array including cell absolute arrangement information extracting means 4-63 to generate the mask data without hierarchically developing all figure data of CAD data in the arithmetic means 4-6. In this case, when the mask data for semiconductor manufacture for realizing one LSI chip are generated, only array parts can hierarchically be developed while held in an array shape for the top cell of the CAD data, so the data after the hierarchic development can be stored in the small-scale storage means and the time for the mask data generation can be shortened.
申请公布号 JPH0553295(A) 申请公布日期 1993.03.05
申请号 JP19910213402 申请日期 1991.08.26
申请人 SEIKO EPSON CORP 发明人 KUROKI KOJI
分类号 G03F1/70;G06F17/50;H01L21/027;H01L21/30;H01L21/82 主分类号 G03F1/70
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