发明名称 |
THIN FILM TRANSISTOR ELEMENT, MANUFACTURE THEREOF AND LIQUID CRYSTAL DISPLAY |
摘要 |
<p>PURPOSE:To form electrodes without using a vacuum device by a method wherein the respective electrodes are formed in a devacuum state. CONSTITUTION:A thin film transistor element is provided with a conductive layer 2 formed on a glass substrate 1, an amorphous silicon active layer 3 formed on the layer 2, a gate electrode 5 formed on the layer 3 via a gate insulating film 4 and drain and source electrodes 9a and 9b formed on the layer 3 via an N<+> amorphous silicon layer 7 and the respective electrodes are deposited by a DC plating method.</p> |
申请公布号 |
JPH0555257(A) |
申请公布日期 |
1993.03.05 |
申请号 |
JP19910218329 |
申请日期 |
1991.08.29 |
申请人 |
HITACHI LTD |
发明人 |
OTA MASUYUKI;TAKAHATA MASARU;NAGAE KEIJI;AOYAMA TAKASHI |
分类号 |
G02F1/136;G02F1/1368;H01L21/208;H01L21/336;H01L27/12;H01L29/78;H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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