发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To maintain various performances, such as profile, heat resistance and residual film ratio, and to improve a sensitivity, resolution and value by incorporating an alkali-soluble resin, quinonediazide compd. and a specific phenol compd. into the above compsn. CONSTITUTION:This compsn. contains the alkali-soluble resin, the quinonediazide compd. and the phenol compd. expressed by formula I. These compds. are obtd. by bringing 1,5-dihydroxynaphthalene and 3-hydrox-alpha-methyl styrene or 4- hydroxy-alpha-methyl styrene into reaction in the presence of an acid catalyst. The quinonediazide compd. is not particularly limited and includes, for example, 1,2-naphthoquinonediazide-4-sulfulate, 1,2-naphthoquinonediazide-5-sulfonate. The alkali-soluble resin used for the compsn. is not particularly limited and includes, for example, a polybiphenol or novolak resin, etc.
申请公布号 JPH0553315(A) 申请公布日期 1993.03.05
申请号 JP19910213558 申请日期 1991.08.26
申请人 SUMITOMO CHEM CO LTD 发明人 TOMIOKA ATSUSHI;KUWANA KOJI;NAKANISHI HIROTOSHI;KAMIYA YASUNORI;IDA AYAKO
分类号 G03F7/022;G03F7/004;H01L21/027 主分类号 G03F7/022
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