| 摘要 |
PURPOSE:To eliminate errors in destinations by providing marks for recognizing the destinations when a semiconductor wafer and a mask are aligned on both the wafer and the mask. CONSTITUTION:The photomask for selective etching of aluminum of the 4th destination is prepd. and is roughly aligned to the semiconductor wafer when the wafer is going to be subjected to the selective etching of the aluminum; for example, in the case of the 4th destination. The marks 3 for alignment of such mask, then, exist on a vernier 1 for alignment for the selective etching of the aluminum. An operator is able to confirm from the indication 5 provided on the vernier 1 for alignment that the mask is the photomask for the selective etching of the aluminum. The operator, thereafter, finely adjusts the marks 3 for alignment so as to bring the marks to the prescribed position of the vernier 1 for alignment and confirms that the mark 4 for indicating the destination registers the figure 4 of the semiconductor wafer side marks 2. |
