| 摘要 |
PURPOSE:To smooth fine ruggedness on a surface and to sharpen the ruggedness corresponding to information by subjecting the surface to an etching treatment by a reverse sputtering method using the stamper side as a target, thereby smoothing the surface. CONSTITUTION:A stamper plate 4 is set as the target side to a high-frequency CRF1 sputtering device. Argon which is a sputtering gas is then kept at 1X10<-3>[Torr] under 2X10<-6>[Torr] vacuum degree and the surface formed with the ruggedness corresponding to the information is subjected to the etching treatment for 20 minutes by the reverse sputtering at 13.56[MHz] and 200[W]. The finer ruggedness than the state of the surface before the treatment is smoothed and the ruggedness to the information is additionally sharpened if the surface of the treated stamper plate 4 is observed. |
