发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To maintain various performances, such as profile, heat resistance and residual film ratio, and to improve a sensitivity, resolution and value by incorporating an alkali-soluble resin, quinonediazide compd. and a specific phenol compd. into the above compsn. CONSTITUTION:This compsn. contains the alkali-soluble resin, the quinonediazide compd. and the phenol compd. expressed by formula I. In the formula I, R1 and R2 are respectively independently a hydrogen atom or alkyl group, substd. or unsubstd. alkoxy group, substd. or unsubstd. alkenyl group or -OCOR3; at least either of R1 and R3 are groups exclusive of the hydrogen atom; R3 denotes a substd. or unsubstd. alkyl group or substd. or unsubstd. phenyl group; X denotes -CO-, -CR'-R''-, -SO2- or formula II; R' and R'' respectively independently denote a hydrogen atom, substd. or unsubstd. alkyl group or alpha-naphthyl group. In the formula I, the substd. or unsubstd. alkyl group of R1 and R2 may be branched.
申请公布号 JPH0553316(A) 申请公布日期 1993.03.05
申请号 JP19910217188 申请日期 1991.08.28
申请人 SUMITOMO CHEM CO LTD 发明人 KAMIYA YASUNORI;TOMIOKA ATSUSHI;KUWANA KOJI;NAKANISHI HIROTOSHI;IDA AYAKO
分类号 G03F7/022;H01L21/027 主分类号 G03F7/022
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