ADHESIVE FILM FOR PROTECTING PHOTOMASK

摘要

PURPOSE:To provide an adhesive film for protecting a photomask having both antistatic and releasing functions in a thickness reduced to a minimum. CONSTITUTION:An antistatic layer 12 of <=1mum thickness is formed on a polyester film 11 of <=20mum thickness and a releasing layer 13 of <=1mum thickness is formed on the antistatic layer 12. An adhesive layer 14 of <=10mum thickness is formed under the polyester film 11.