Improved sensitization of photopolymerizable compositions.

摘要

Photopolymerizable compositions containing free-radically polymerizable monomer, diaryl iodonium or triaryl sulfonium complex salts, and certain 1,3,5-tri(monoaryl)-2-pyrazolines. In dual-curable systems, epoxides are also polymerized. The inventive photopolymerizable compositions exhibit high photosensitivities and are relatively unaffected by the presence of oxygen.