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发明名称
METHOD FOR FABRICATING A SEMICONDUCTOR LASER DEVICE IN WHICH THE P-TYPE CLAD LAYER AND THE ACTIVE LAYER ARE GROWN AT DIFFERENT RATES
摘要
申请公布号
US5190891(A)
申请公布日期
1993.03.02
申请号
US19910710483
申请日期
1991.06.05
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人
YOKOTSUKA, TATSUO;TAKAMORI, AKIRA;NAKAJIMA, MASATO;SUZUKI, TOMOKO
分类号
H01L33/00;H01S5/30;H01S5/323
主分类号
H01L33/00
代理机构
代理人
主权项
地址
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