| 发明名称 |
Chemical vapor deposition of aluminum films using dimethylethylamine alane |
| 摘要 |
This invention provides essentially pure dimethylethylamine alane, which is useful for the chemical vapor deposition of thin films of aluminum.
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| 申请公布号 |
US5191099(A) |
申请公布日期 |
1993.03.02 |
| 申请号 |
US19910755317 |
申请日期 |
1991.09.05 |
| 申请人 |
REGENTS OF THE UNIVERSITY OF MINNESOTA |
发明人 |
GLADFELTER, WAYNE L.;PHILLIPS, EVERETT C. |
| 分类号 |
C07F5/06;C23C16/20 |
主分类号 |
C07F5/06 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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