发明名称 |
METHOD FOR DEPOSITION OF A METAL |
摘要 |
In the deposition of metal on solid substrates by a Metal Organic Chemical Deposition process, an improvement comprises the provision of vapors of a precursor of the metal by passing an inert carrier gas through a mixture of the metal precursor and a liquid having a vapor pressure at ambient temperature lower than that of the metal precursor and in which the metal precursor is at least partially soluble. |
申请公布号 |
AU2387192(A) |
申请公布日期 |
1993.03.02 |
申请号 |
AU19920023871 |
申请日期 |
1992.07.28 |
申请人 |
SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. |
发明人 |
DARIO MARCELLO FRIGO;ANTONIUS WILHELMUS GAL |
分类号 |
C23C16/30;C23C16/44;C23C16/448;C23C16/455;C30B25/02;C30B25/14 |
主分类号 |
C23C16/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|