| 摘要 |
PURPOSE:To detect the location of a pattern configuration the same as or analogous with a pattern configuration under display from LSI patterns and to automatically move a sample so as to display this location by comprising an image displayer, a position calculation processor, and a stage movement controller. CONSTITUTION:When defects are detected in a result of LSI patterns, first a pattern data position calculation processor 16 transfers chip numbers and a position coordinate determined by a stage position measurer 7 into a design pattern data processor 12. The design pattern processor 12 extrudes a pattern near a position coordinate, extracts a pattern configuration relation the same as analogous with this extruded pattern configuration relation from design pattern data, transfers this extract into a stage movement controller 8, and makes the stage to move to that position. This process enables an image of the location of a pattern configuration the same as or analogous with the location of a pattern configuration with detected defects to be displayed on a scanning type electron microscopic (SEM) image displayer 6. |
