发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To enable formation of fine patterns having good cross-sectional shapes by incorporating an alkali-soluble polymer, a dissolution inhibitor, a compd. which produces acid by irradiation of light, and a specified compd. which suppresses diffusion of acid. CONSTITUTION:This compsn. contains an alkali-soluble polymer, a dissolution inhibitor comprising an org. matter having a substituent which is decomposed by acid, a compd. which produces acid by irradiation of light, and compd. expressed by formulae I-III. In formulae I-III, X1, X3, and X5 are O atoms or S atoms, X2 is N atom or CR<4> group, X4 is N atom or CR<7>, X6 is N atom or CR<11>, and R<1>-R<11> are unsubstd. or substd. heterocyclic groups, unsubstd. or substd. aromatic hydrocarbon groups, unsubstd. or substd. aliphatic hydrocarbon groups, unsubstd. or substd. alicyclic hydrocarbon groups, other characteristic groups or hydrogen atoms respectively.
申请公布号 JPH0545883(A) 申请公布日期 1993.02.26
申请号 JP19910353015 申请日期 1991.12.18
申请人 TOSHIBA CORP 发明人 KOBAYASHI YOSHIHITO;ONISHI KIYONOBU;NIKI HIROICHI
分类号 C08K5/353;C08K5/35;C08K5/41;C08K5/45;C08K5/46;C08K5/54;C08K5/544;C08L101/00;G03F7/004;G03F7/029;G03F7/038;G03F7/039;G03F7/075;H01L21/00;H01L21/027 主分类号 C08K5/353
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