| 摘要 |
<p>PURPOSE:To easily prevent the drop-out of reticule patterns by a rotary brush of a reticule washing machine by protecting the patterns for forming fine elements with dummy patterns which do not form the elements. CONSTITUTION:This reticule has the chromium patterns 1, 2 for forming the elements on quartz glass 6. These patterns are protected by forming the dummy patterns 4, 5 which do not form the elements around the patterns. The size of the dummy pattern 4 of the reticule changes when this reticule is washed several 100 times by the reticule washing machine. The reticule of this time can protect the patterns 1, 2 for forming the elements by the dummy patterns 4, 5 which do not form the elements. The area of the reticule can be reduced if the rotating direction of the rotary brush of the washing machine and the direction of the reticule to be set are fixed.</p> |
