发明名称 FORMATION OF THIN FILM
摘要 PURPOSE:To reduce a quantity of gas consumption and to easily obtain a thin film of a high specific resistance by a method wherein a thin film is formed on a substrate in such way that a minus side electrode and a plus side electrode are provided leaving a prescribed space from the substrate side and a DC glow discharge is used. CONSTITUTION:On the bottom of a vacuum case 1 having a vacuum exhaust system 9, a plus-side electrode 3 with a CH4 leading-in opening 6 at the central part is provided and a mesh form minus-side electrode 2 is provided on said electrode 3. A substrate holder 4 with a substrate 5 such as glass or the like is adhered on the undersurface is provided on the ceiling of the above electrode 2, a minus-side terminal coming from a DC power source 8 located on the outside is connected to the holder 4 and a plus-side terminal is connected to the electrode 3 respectively. With the above constitution, CH4 gas is filled in the case 1 using a valve 7, the inside of the case 1 is maintained at about 0.1Torr, flow discharge is generated by applying a voltage of approximately 950V and a high resistance carbon film is precipitated on the surface of the substrate 5.
申请公布号 JPS5649521(A) 申请公布日期 1981.05.06
申请号 JP19790124847 申请日期 1979.09.28
申请人 KAJIWARA YASUMITSU 发明人 KAJIWARA YASUMITSU
分类号 C23C16/50;C23C16/27;C23C16/503;H01L21/205;H01L31/04 主分类号 C23C16/50
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