发明名称 |
VERFAHREN ZUR HERSTELLUNG EINES SILICON ENTHALTENDEN POLYIMIDS SOWIE DESSEN VORSTUFE. |
摘要 |
<p>A process for producing a silicon-containing polyamic acid percusion for a silicon-containing polyamide comprises reacting a silicon-containing Polyamic acid having an inherent viscosity of 0.05 to 5 dl/g (as measured in N-methyl-2-pyrrolliidene in a concentration of 0.5 g/do at 30 DEG + 0.0 DEG C), Which process comprises reacting A<1> mols of pyromeltic dianhydride (PMDA) and A<2> mols of 3,3 min ,4,4 min -biphenyltetracarboxylic anhydride (BPDA). the values A<1> and A<2> salifying the relationship <CHEM> with B mols of a diamine of the formula: <CHEM> (in which R<1> is a halogen atom or a methyl, ethyl, methoxy or ethoxy group; m is 0, 1 or 2; and n is 1 or 2); and C mols of an aminosilicon compound of the formula: <CHEM> (in which R<2> is a C1-C6 alkyl group, a phenyl group or a phenyl group substituted with a C1-C6 alkyl group; X is a hydrolysable alkoxy or acetoxy groups or a halogen atom; and k is 1, 2 or 3); the values B and C satisfying the relationship; <CHEM> A solution of the silicon-containing polyamic acid precursion is baked at 50 DEG C to 500 DEG C to afford a silicon-coating polyimide.</p> |
申请公布号 |
DE3873844(T2) |
申请公布日期 |
1993.02.18 |
申请号 |
DE19883873844T |
申请日期 |
1988.06.16 |
申请人 |
CHISSO CORP., OSAKA, JP |
发明人 |
KUNINUNE, KOUICHI, ICHIHARASHI CHIBAKEN, JP;KUTSUZAWA, YOSHIYA, YOKOHAMASHI KANAGAWAKEN, JP;KONOTSUNE, SHIRO, YOKOSUKASHI KANAGAWAKEN, JP |
分类号 |
C08G73/10;C09J179/08;G02F1/1337;(IPC1-7):C08G73/10 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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