发明名称 A LAMINAR STRUCTURE FOR ADMINISTERING A CHEMICAL AT A CONTROLLED RELEASE RATE
摘要 <p>A laminar structure for administering a chemical at a controlled release rate is disclosed. The structure comprises a backing member which acts as a boundary through which the chemical does not pass. Contacting at least a portion of the backing member is a chemical containing layer having therein a first chemical portion and a second chemical portion. The first and second chemical portions comprise a mixture of chemical in a first concentration transport mode and a second concentration transport mode. The mixture being in a ratio to give a desired chemical release rate from the chemical containing layer.</p>
申请公布号 GR3003055(T3) 申请公布日期 1993.02.17
申请号 GR19910401334T 申请日期 1991.11.01
申请人 HOECHST-ROUSSEL PHARMACEUTICALS INCORPORATED 发明人 KIM, KWON H.;HENDERSON, NORMAN L.;CHIEN, YIE W.
分类号 A61K9/70;A61L15/16;A61M31/00;A61M35/00;(IPC1-7):A61M35/00 主分类号 A61K9/70
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