发明名称 |
A LAMINAR STRUCTURE FOR ADMINISTERING A CHEMICAL AT A CONTROLLED RELEASE RATE |
摘要 |
<p>A laminar structure for administering a chemical at a controlled release rate is disclosed. The structure comprises a backing member which acts as a boundary through which the chemical does not pass. Contacting at least a portion of the backing member is a chemical containing layer having therein a first chemical portion and a second chemical portion. The first and second chemical portions comprise a mixture of chemical in a first concentration transport mode and a second concentration transport mode. The mixture being in a ratio to give a desired chemical release rate from the chemical containing layer.</p> |
申请公布号 |
GR3003055(T3) |
申请公布日期 |
1993.02.17 |
申请号 |
GR19910401334T |
申请日期 |
1991.11.01 |
申请人 |
HOECHST-ROUSSEL PHARMACEUTICALS INCORPORATED |
发明人 |
KIM, KWON H.;HENDERSON, NORMAN L.;CHIEN, YIE W. |
分类号 |
A61K9/70;A61L15/16;A61M31/00;A61M35/00;(IPC1-7):A61M35/00 |
主分类号 |
A61K9/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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