发明名称 Method and apparatus for grinding notches of semiconductor wafer
摘要 A method of grinding the notch of a thin workpiece, for example, a semiconductor wafer in the circumferential direction and the thickness direction by arranging a rotating disk-form grinding wheel and a semiconductor wafer to be ground with said wheel in such positions that the respective planes orthogonally cross with each other, moving said wheel in an axial direction of the spindle or rotating said semiconductor wafer upon the center thereof, moving said semiconductor wafer in a direction of approach to or alienation from said wheel, and moving said wheel in a direction to cross orthogonally with said axial line direction and direction of approach to or alienation from said wheel, and an apparatus therefor.
申请公布号 US5185965(A) 申请公布日期 1993.02.16
申请号 US19910729291 申请日期 1991.07.12
申请人 DAITO SHOJI CO., LTD.;EMTEC CO., LTD. 发明人 OZAKI, HARUO
分类号 B24B9/06 主分类号 B24B9/06
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