发明名称 Semiconductor device
摘要 A storage electrode of a trench capacitor is connected through a trench side wall contact hole to a source/drain region. A p+ region is provided between the source/drain region and an n+ region which is a part of a cell plate, and is opposite through a silicon oxide film and a capacitive insulation film to the storage electrode.
申请公布号 US5187550(A) 申请公布日期 1993.02.16
申请号 US19920826537 申请日期 1992.01.27
申请人 NEC CORPORATION 发明人 YANAGISAWA, MASAYUKI
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L27/10;H01L27/108 主分类号 H01L27/04
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