发明名称 Process for improved doping of semiconductor crystals
摘要 Doping of IIIB-VB semiconductor crystals grown by the liquid encapsulated Cyochralski techniques is improved by introducing a metal to the crucible. The metal is characterized as having a lower melting temperature and a lower free energy of oxide formation than the dopant element.
申请公布号 US5186784(A) 申请公布日期 1993.02.16
申请号 US19890368561 申请日期 1989.06.20
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 RAU, MANN-FU;WANG, FAA-CHING M.;KURZ, JIMMY D.
分类号 C30B15/00;C30B15/04 主分类号 C30B15/00
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