| 摘要 |
A process is described for forming a coherent refractory mass on a surface based on a silicon compound, wherein there is projected against the surface, simultaneously with oxygen, a mixture comprising refractory particles and combustible particles which react in an exothermic manner with the projected oxygen by releasing sufficient heat to form the refractory mass, under the action of heat of combustion. The mixture comprises combustible silicon particles, refractory particles of one or a plurality of substances which constitute the major portion by weight of the mixture, as well as particles of another substance and/or non-metallic particles whose composition is such that, during the formation of the refractory mass, they generate said other substance in such a way that said other substance causes the incorporation of silica, formed by the combustion of the silicon particles, into a crystalline lattice. |
