| 摘要 |
PURPOSE:To obtain a junction element with a Josephson junction region having excellent dimensional accuracy and an area in accordance with a design by using a mask layer with the pattern of the crossed section of mutually crossed striped masks as a mask for specifying the Josephson junction region. CONSTITUTION:A mask layer 15 is formed onto three-layer films of a first superconductor layer 12, a tunnel barrier layer 13 and a second superconductor layer 14 continuously shaped onto a substrate 11, and a striped first etching mask 16 is formed. An exposed section is etched completely and the mask 16 is peeled, a striped second etching mask 15' is shaped so as to cross with the pattern of the mask layer 15, and the exposed section of the mask layer 15 is etched completely to form a rectangular mask layer 15. An exposed section from the mask layer 15 of the second superconductor layer 14 is removed perfectly through etching, thus specifying a Josephson junction section. Accordingly, a junction pattern having excellent dimensional accuracy in accordance with a design value can be acquired. |
