| 摘要 |
Oven of the well type with resistive heating for the treatment of plasma of long metallic components (9), including an evacuated chamber (1) composed of at least two shelves (2) each equipped with a heating device with heating resistors (5), the resistors being composed of a current inlet (6) and a collector (7) which are long and straight and parallel, resistive heating elements (8) connecting the current inlet and the collector and being welded perpendicularly to these, the said heating devices defining, with the shelves, at least two heating zones, in which oven the collector and/or current inlet includes at least one localised means (10) for temperature regulation. <IMAGE>
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