发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To provide a positive type resist compsn. having high gamma, fine profile and a proper depth of a focus while maintaining such properties as sensitivity, heat resistance and appliability. CONSTITUTION:This positive type resist compsn. contains a quinonediazido compd., an alkali-soluble resin and a solvent system contg. one or more kinds of org. solvents selected among gamma-butyrolactone, 3-methoxybutanol and cyclohexanone and other org. solvent not having both alkylcarbonyl and alkoxy groups in the molecule and having 140-180 deg.C b.p. under atmospheric pressure.
申请公布号 JPH0534919(A) 申请公布日期 1993.02.12
申请号 JP19910316500 申请日期 1991.11.29
申请人 SUMITOMO CHEM CO LTD 发明人 KAMIYA YASUNORI;DOI YASUYOSHI;HASHIMOTO KAZUHIKO;OZAKI HARUKI;HANAWA RYOTARO
分类号 G03F7/022;G03F7/004;G03F7/039;G03F7/22;H01L21/027 主分类号 G03F7/022
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