摘要 |
PURPOSE:To provide a positive type resist compsn. having high gamma, fine profile and a proper depth of a focus while maintaining such properties as sensitivity, heat resistance and appliability. CONSTITUTION:This positive type resist compsn. contains a quinonediazido compd., an alkali-soluble resin and a solvent system contg. one or more kinds of org. solvents selected among gamma-butyrolactone, 3-methoxybutanol and cyclohexanone and other org. solvent not having both alkylcarbonyl and alkoxy groups in the molecule and having 140-180 deg.C b.p. under atmospheric pressure. |