发明名称 MEMORY ELEMENT AND MANUFACTURE OF THE SAME
摘要 PURPOSE:To obtain high capacitance material which improves high dielectric constant, non-ferroelectric property and temperature dependent characteristics of dielectric constant and also ensures a high withstand voltage by expressing a material to form a capacitor with a specific formula. CONSTITUTION:A high dielectric constant film 32 expressed by (Sr1-xCax)TiO3 is formed and subsequently capacitor electrodes 33a, 33b are formed by selectively etching a high dielectric constant film 32 and an electrode layer 31 for capacitor. A material which forms a capacitor is expressed by the formula, namely, (Sr1-x-yCaxMay)(Tiz-wMbw)O3. In this formula, x=0 to 0.2, y=0.001 to 0.01 and Ma is a kind of La, Bi, Sb, Y and lanthanum family element and Mb is a kind of Nb, V, Ta, Mo and W. Thereby, a capacitor material which ensures high dielectric constant, anti-ferroelectric property and good temperature dependent characteristic of dielectric constant can be obtained.
申请公布号 JPH0536931(A) 申请公布日期 1993.02.12
申请号 JP19910187686 申请日期 1991.07.26
申请人 OLYMPUS OPTICAL CO LTD 发明人 ADACHI HIDEO
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L27/10;H01L27/108 主分类号 H01L27/04
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