X-RAY MASK AND MANUFACTURE OF X-RAY MASK

摘要

PURPOSE:To prevent an X-ray absorber thin-film pattern from being dislocated during an etching-back operation and to obtain a high-accuracy X-ray mask by a method wherein an X-ray mask support body provided with a warp in advance is used as an X-ray mask support body so that the X-ray mask support body becomes flat when an X-ray transmitting film is formed. CONSTITUTION:A 3-inch Si substrate 1 having orientation (111) which is provided with a warp of 6mum and whose thickness is 600mum is set on a susceptor whose graphite surface has been coated with SiC in such a way that it is directed to a direction in which its warp amount is offset. An X-ray mask is provided with the following: an X-ray absorber thin-film pattern formed on a first X-ray transmitting film formed on the surface of the mask support body 21; and a second X-ray transmitting thin film which is fixed and bonded to a support frame 27 bonded to the rear of the mask support body 21, which is formed by keeping a prescribed interval from the first X-ray transmitting thin film and which is constituted so as to form a closed space having a vent to the atmosphere between itself and the first X-ray transmitting thin film.