| 摘要 |
<p>PURPOSE:To provide a wafer cleaning tank in which wafers can be cleaned by dipping the wafers in a cleaning liquid while the wafers are held one by one in nearly vertical attitudes. CONSTITUTION:This wafer cleaning tank E is provided with a flat tank 110 in which a cleaning liquid is contained, holder 120 which supports wafers W in nearly vertical attitudes in the tank 110, and injection nozzle from which the cleaning liquid is jetted upon the upper surface section of the wafers W supported by the holder 120. One of the wafers W is dipped in the cleaning liquid in the tank and cleaned while the wafer W is held in a nearly vertical attitude by the holder 120. While the wafer W is cleaned, the wafer W is stably maintained in the nearly vertical attitude, because the wafer W is pressed against the holder 120 in a state where the wafer W is slightly titled from the perpendicular direction by the cleaning liquid jetted upon the upper section of the wafer W from the nozzle.</p> |
