| 摘要 |
The surface-flattening method of a poly layer comprises (a) patterning a first poly layer (2) on the substrate (1), depositing an oxide layer (3) of 2000-3000 angstroms on the whole surface by the LPCVD method, covering a SOG (spin-on-glass) layer (6) of 800- 1200 angstroms on the layer (3), heat-treating the substrate under the N2 atmosphere at 400-470 deg.C, etching-back the layer (6) to form a SOG side wall (6a) on the layer (3), selectively lifting off the layer (3) to form a contact hole, and forming a second poly layer (4) and then patterning it.
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