| 摘要 |
For the essentially continuous treatment of material (1) in a reaction facility with a reactant solution (5, 7), a feed device (3) is provided to feed in the material (1) and coat it with reactant solution (5, 7). A continuous flow conduit or channel (13) is provided which follows on from the feed device and is essentially closed, with an inlet (11) and outlet (15) opening, and through which the material (1) undergoing treatment and the reactant solution (7) are fed. |
