| 摘要 |
<p>An over-flow tank for a semiconductor wafer washing apparatus includes a pair of opposed extensions integrally formed on a pair of opposed side walls of the tank. One of the extensions is provided with pipes and/or other devices. This form of attachment prevents formation of a stepped portion on which dust may accumulate. The extensions also act to guide the flow of clean air over the tanks, so that vapor formed in a chemical liquid tank in one row of such tanks is prevented from entering a pure water tank in an adjacent row.</p> |
