| 摘要 |
PURPOSE:To provide a method for processing a wafer, which eliminates a wasteful time for preparing the wafer and can efficiently operate an apparatus. CONSTITUTION:In a method for processing a semiconductor exposure apparatus having a step 1 of conveying a preceding wafer, a step 2 of processing the wafer, a step 4 of deciding a processed result of the wafer, a step 3 of conveying a wafer to be processed next to the preceding wafer, a step 5 of generating a lot process start command of a wafer, and a step 6 of lotprocessing the wafer, the step 3 of conveying the wafer to be processed next is executed in parallel with the step 2 of processing the preceding wafer. |
