| 摘要 |
<p>PURPOSE:To provide a photo-or radiation-sensitive compsn. having enough sensitivity for light and suitable for lithography using short wavelength light such as far UV ray. CONSTITUTION:The polymer or oligomer as the main component has a siloxane structure (-Si-O-) as the skeleton of the chemical compsn. This polymer has an end group or side chain group which polymerizes by condensation with an anion or cation seed produced by light or radiation. Thereby, this photo-or radiation-sensitive compsn. becomes insoluble with a solvent after irradiation of light or radiation. In this process, not only an org. solvent is used as a developer but it can be developed with an alkali aq. soln. by providing polarity to the end group. The light or irradiation means visible light, UV ray, far UV ray, vacuum UV ray, X ray, gamma ray, electron beam, ion beam, etc.</p> |
