| 摘要 |
PURPOSE:To enhance sensitivity to a visible light and adhesion to a substrate and to form an accurate pattern with high sensitivity by using the photopolymerizable composition comprising a specified graft copolymer, a specified linear polymer, and a specified polyfunctional monomer. CONSTITUTION:This photopolymerizable composition comprises (A) the graft copolymer having a main chain composed of monomer units derived from alkyl methacrylate and the like, and side chains each composed of monomer units each derived from monomers represented by formulae I, II, and the like, having a number average molecular weight of 5X10<3>-5X10<4>, (B) the linear polymer composed of repeating units each derived from the monomers of methyl methacrylate and those of formulae I and II and the like, and having a number average molecular weight of 5X10<4>-35X10<4>, and a glass transition point of <=60 deg.C, (C) the polyfunctional monomer having >=2 ethylenically unsaturated bonds and no epoxy group, (D) the polyfunctional epoxy resin partially esterified by acrylic acid, (E) anaromatic sulfonium salt and the like free radical generator, and (F) a sensitizer, such as coumarin. |
