| 摘要 |
<p>PURPOSE:To provide the title vapor deposition device capable of easily removing a crystal substrate from a seat without being caught in the seat when the crystal substrate is mounted on a susceptor provided with a circular recessed seat so as to be vapor deposition reacted. CONSTITUTION:A flat contact part 43 forming a notch part 41 capable of coming into contact with the intermediate part of the orientation flat part 13 of a crystal substrate 1 and receiving the corner part 45 of said orifla-part 13 is formed between the inner wall of the seat 35 and said orifla-part 13. Through these procedures, the corner part 45 shall not abut against the flat contact part 43 so that the crystal substrate 1 may not be caught in the space between the flat contact part 43 and the seat 35 not to be locked therein thereby enabling the crystal substrate 1 to be easily removed from the seat 35.</p> |
