METHOD OF FORMING INSULATING FILM BY PLASMA CVD,申请号JP19910182126-传众专利搜索

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发明名称	METHOD OF FORMING INSULATING FILM BY PLASMA CVD
摘要
申请公布号	JPH0529306(A)	申请公布日期	1993.02.05
申请号	JP19910182126	申请日期	1991.07.23
申请人	ASAHI KASEI MICRO SYST KK	发明人	HITOMI KIMITAKE
分类号	H01L21/31;H01L21/314;H01L21/318	主分类号	H01L21/31
代理机构		代理人
主权项
地址

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