SILICA BASE MATERIAL IRREFLEXIVE PLANED LAYER

摘要

PURPOSE: To obtain a dyed spin-on glass compsn. having a high carbon content to be used to form a nonreflecting flattening layer on a substrate such as a semiconductor silicon wafer. CONSTITUTION: The spin-on glass compsn. contains a polyorganosiloxane polymer soln. which is crosslinked and contains an org. dye showing stable absorption of light at 350 to 500 deg.C. The polyorganosiloxane polymer contains at least 30atm.% carbon and aminoorgano trialkoxysilane. The alkoxy groups have 1 to 4 carbon atoms. The obtd. layer can be used as a hard mask by etching according to a pattern formed on the layer. The hard mask can be used as a multilayer resist and used for the production of a lithography mask.