发明名称 |
GRINDING METHOD FOR FERROELECTRIC SUBSTANCE WAFER |
摘要 |
PURPOSE:To offer the grinding method of a ferroelectric substance where grinding work is accurately executed in short time. CONSTITUTION:A wafer 1 consists of the single crystal of tantalic acid lithium or niobic acid lithium adding Z-axis component in the orientation of a wafer face. In the wafer, grinding speed is different concerning a positive side polarization face + and the negative side polarization face --in spite of relation where the positive side polarization face + and the negative side polarization face -are the surface and back faces of a same thing. The positive polarization faces + have almost same grinding speed with each other and the negative side polarization faces-have almost same grinding speed with each other. The speed of the positive side polarization face f is faster than that of the negative side polarization face. When the plural wafers are simultaneously ground, either of the positive side polarization face + or the negative side polarization face -is arranged so as to simultaneously execute grinding so that grinding work is accurately executed in short time. |
申请公布号 |
JPH0529866(A) |
申请公布日期 |
1993.02.05 |
申请号 |
JP19910186270 |
申请日期 |
1991.07.25 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
ITO KUNIHIRO;RIYUUOU TOSHIHIKO |
分类号 |
B24B7/22;B24B37/04;H03H3/08 |
主分类号 |
B24B7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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