发明名称 GRINDING METHOD FOR FERROELECTRIC SUBSTANCE WAFER
摘要 PURPOSE:To offer the grinding method of a ferroelectric substance where grinding work is accurately executed in short time. CONSTITUTION:A wafer 1 consists of the single crystal of tantalic acid lithium or niobic acid lithium adding Z-axis component in the orientation of a wafer face. In the wafer, grinding speed is different concerning a positive side polarization face + and the negative side polarization face --in spite of relation where the positive side polarization face + and the negative side polarization face -are the surface and back faces of a same thing. The positive polarization faces + have almost same grinding speed with each other and the negative side polarization faces-have almost same grinding speed with each other. The speed of the positive side polarization face f is faster than that of the negative side polarization face. When the plural wafers are simultaneously ground, either of the positive side polarization face + or the negative side polarization face -is arranged so as to simultaneously execute grinding so that grinding work is accurately executed in short time.
申请公布号 JPH0529866(A) 申请公布日期 1993.02.05
申请号 JP19910186270 申请日期 1991.07.25
申请人 SHIN ETSU CHEM CO LTD 发明人 ITO KUNIHIRO;RIYUUOU TOSHIHIKO
分类号 B24B7/22;B24B37/04;H03H3/08 主分类号 B24B7/22
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