| 摘要 |
A positive resist composition having a high gamma value, which comprises an alkali-soluble resin and at least one quinoneazido-sulfonate of a phenolic compound represented by general formula (I) wherein Y1, Y2, Z1, Z2, Z3, Z4, Z5, Z6, and Z7 represent each a C1 to C4 alkyl which may be substituted by a halogen atom, hydrogen, or OH, provided that at least one of Y1 and Y2 is OH and at least two of Z1, Z2, Z3, Z4, Z5, Z6 and Z7 are OH groups; and R1, R2, R3, R4 R5 and R6 represent each hydrogen, C1 to C10 alkyl, C1 to C4 alkenyl, cycloalkyl or aryl. <CHEM> |
