MAGNETRON SPUTTERING CATHODE,申请号JP19910044300-传众专利搜索

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发明名称	MAGNETRON SPUTTERING CATHODE
摘要
申请公布号	JPH0525625(A)	申请公布日期	1993.02.02
申请号	JP19910044300	申请日期	1991.02.17
申请人	ULVAC JAPAN LTD	发明人	OKUTSU SEIICHI;MAEDA SHINICHIRO
分类号	C23C14/35	主分类号	C23C14/35
代理机构		代理人
主权项
地址

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