发明名称 |
PRODUCTION OF RADIATION-SENSITIVE COMPONENT, AND POSITIVE RESIST COMPOSITION |
摘要 |
PURPOSE:To provide a process for producing the subject component in a short time without causing deposition and to provide the subject compsn. having an improved resolution. CONSTITUTION:The objective component is produced by condensing a phenol compd. with a diazidoquinonesulfonic acid halide in a solvent mixture consisting of a solvent having a specific permittivity of 10 or lower and one having a specific permittivity of 15 or higher, and is used for producing the objective compsn. |
申请公布号 |
JPH0525257(A) |
申请公布日期 |
1993.02.02 |
申请号 |
JP19910178184 |
申请日期 |
1991.07.18 |
申请人 |
SUMITOMO CHEM CO LTD |
发明人 |
TOMIOKA ATSUSHI;KUWANA KOJI;NAKANISHI HIROTOSHI;TAKAGAKI HIROSHI;DOI YASUYOSHI;KAMIYA YASUNORI;HANAWA RYOTARO |
分类号 |
C08G61/00;C07C303/28;C07C309/76;C07D311/60;G03F7/022;H01L21/027 |
主分类号 |
C08G61/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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