发明名称 PRODUCTION OF RADIATION-SENSITIVE COMPONENT, AND POSITIVE RESIST COMPOSITION
摘要 PURPOSE:To provide a process for producing the subject component in a short time without causing deposition and to provide the subject compsn. having an improved resolution. CONSTITUTION:The objective component is produced by condensing a phenol compd. with a diazidoquinonesulfonic acid halide in a solvent mixture consisting of a solvent having a specific permittivity of 10 or lower and one having a specific permittivity of 15 or higher, and is used for producing the objective compsn.
申请公布号 JPH0525257(A) 申请公布日期 1993.02.02
申请号 JP19910178184 申请日期 1991.07.18
申请人 SUMITOMO CHEM CO LTD 发明人 TOMIOKA ATSUSHI;KUWANA KOJI;NAKANISHI HIROTOSHI;TAKAGAKI HIROSHI;DOI YASUYOSHI;KAMIYA YASUNORI;HANAWA RYOTARO
分类号 C08G61/00;C07C303/28;C07C309/76;C07D311/60;G03F7/022;H01L21/027 主分类号 C08G61/00
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